355 nm | Fused Silica | Telecentric

355 nm | Fused Silica | Telecentric

Our telecentric F-Theta lenses for the wavelength of 355 nm have been developed for particularly challenging laser applications. The impact angle of the laser beam is close to 90° in the whole working area.

Different models are available with input apertures from 9 to 15 mm and for working areas up to 200 x 200 mm.

They enable high precision focusing of laser beams in the working area, with minimal telecentric error, making them suitable for the most challenging applications, especially when variation of the spot symmetry and the angle of impact, would cause a problem for precise laser processing.

A telecentric fused silica F-Theta lens provides accuracy and precision, combined with high laser power tolerance and temperature stability.

Special Features:
Telecentric Fused Silica Lens
Large working areas up to 200 x 200 mm
Focal lengths from f-30 to f-365
Input apertures from 9 to 15 mm
Typical Laser Applications:
Engraving
Drilling
Structuring
Additive Manufacturing
Cutting
Typical Materials:

glass

ceramics

plastics

lacquer

355 nm | Fused Silica | Telecentric

Model NameWavelengthNominal Focal LengthWorking DistanceMaximum Scan FieldMaximum Input Beam Diameter Minimum Spot SizeTelecentric ErrorLens MaterialMounting ThreadLens DiameterCooling MethodInquiryDetail
f-30T-10-355355 nm30 mm35.347 mm8 mm x 8 mm10 mm1.95 μm1.8 °Fused SilicaM39x147 mmAir
f-32T-10-355355 nm32 mm28.493 mm1 mm x 1 mm10 mm2.08 μm0.4 °Fused SilicaM85x190 mmAir
f-65T-10-355355 nm65 mm81.106 mm15 mm x 15 mm10 mm4.22 μm1.8 °Fused SilicaM85x194 mmAir
f-70T-10-355355 nm70 mm91.350 mm28 mm x 28 mm10 mm4.55 μm1 °Fused SilicaM85x190 mmAir
f-100T-10-343343 nm100 mm121.500 mm50 mm x 50 mm10 mm5.91 μm1.8 °Fused SilicaM85x1120 mmAir
f-100T-10-355355 nm100 mm135.475 mm50 mm x 50 mm10 mm6.5 μm0.5 °Fused SilicaM85x1120 mmAir
f-100T-14-355355 nm100 mm135.475 mm50 mm x 50 mm14 mm5 μm0.5 °Fused SilicaM85x1120 mmAir
f-103T-9-355355 nm103 mm134.853 mm50 mm x 50 mm9 mm7.43 μm1.93 °Fused SilicaM85x1100 mmAir
f-125T-10-355355 nm125 mm172.076 mm60 mm x 60 mm10 mm8.12 μm2.8 °Fused SilicaM85x1120 mmAir
f-167T-10-355-F355 nm167 mm226.500 mm100 mm x 100 mm10 mm9.92 μm5.1 °Fused SilicaM85x1128 mm
f-167T-10-355-P355 nm167 mm230.100 mm90 mm x 90 mm10 mm9.75 μm4.4 °Fused SilicaM85x1128 mm
f-167T-14-355355 nm167 mm234.520 mm90 mm x 90 mm14 mm7.75 μm0.48 °Fused SilicaM85x1140 mmAir
f-175T-14-343343 nm175 mm138.800 mm100 mm x 100 mm14 mm7.55 μm2.5 °Fused SilicaM85x1160 mmAir
f-175T-14-355355 nm175 mm240.400 mm100 mm x 100 mm14 mm7.87 μm2.5 °Fused SilicaM85x1160 mmAir
f-320T-14-355355 nm320 mm423.000 mm180 mm x 180 mm14 mm13.37 μm2.2 °Fused SilicaM85x1303 mmAir
f-365T-14-355355 nm365 mm536.400 mm200 mm x 200 mm14 mm15.76 μm2.5 °Fused Silica285 mmAir